The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2012
Filed:
Jul. 05, 2007
Applicant:
Tzong-hsien Wu, Hsinchu, TW;
Inventor:
Tzong-Hsien Wu, Hsinchu, TW;
Assignee:
MACRONIX International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/70 (2006.01); G03B 27/54 (2006.01); G03B 27/32 (2006.01); G03B 27/52 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of defining patterns in a small pitch is described. A substrate having a target layer thereon is provided, and two laterally separate reflective structures with two opposite sidewalls are formed over the target layer. A photoresist layer is formed over the target layer between the two opposite sidewalls. An exposure step is performed allowing light to be reflected by the two opposite sidewalls in the lateral direction, wherein the two opposite sidewalls are spaced by a distance to cause the reflected light to produce a periodical intensity distribution in the photoresist layer in the lateral direction.