The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2012
Filed:
Sep. 21, 2010
Iqbal A. Shareef, Fremont, CA (US);
James V. Tietz, Fremont, CA (US);
Vernon Wong, Mountain View, CA (US);
Richard J. Meinecke, Fremont, CA (US);
Iqbal A. Shareef, Fremont, CA (US);
James V. Tietz, Fremont, CA (US);
Vernon Wong, Mountain View, CA (US);
Richard J. Meinecke, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate is provided. The method includes delivering the process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one pressure sensor. The method also includes applying, using a programmed computing device, a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.