The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2012
Filed:
Feb. 27, 2006
Masato Doura, Osaka, JP;
Takeshi Fukuda, Osaka, JP;
Kazuyuki Ogawa, Osaka, JP;
Atsushi Kazuno, Osaka, JP;
Hiroshi Seyanagi, Osaka, JP;
Masahiko Nakamori, Otsu, JP;
Takatoshi Yamada, Otsu, JP;
Tetsuo Shimomura, Otsu, JP;
Masato Doura, Osaka, JP;
Takeshi Fukuda, Osaka, JP;
Kazuyuki Ogawa, Osaka, JP;
Atsushi Kazuno, Osaka, JP;
Hiroshi Seyanagi, Osaka, JP;
Masahiko Nakamori, Otsu, JP;
Takatoshi Yamada, Otsu, JP;
Tetsuo Shimomura, Otsu, JP;
Toyo Tire & Rubber Co., Ltd., Osaka-shi, JP;
Abstract
A method for manufacturing a polishing pad made from a polyurethane resin foam having very uniform, fine cells therein and a polishing pad obtained by that method provides a polishing pad having better polishing characteristics (especially, in planarization) while providing improved dressability while maintaining the planarization characteristics and polishing speed of a conventional polishing pad. The polyurethane resin foam is a cured product obtained by reacting an isocyanate-terminated prepolymer with an aromatic polyamine chain extender having a melting point of 70° C. or lower, for example.