The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2012
Filed:
Oct. 29, 2009
Shuhei Yamaguchi, Haibara-gun, JP;
Tomotaka Tsuchimura, Haibara-gun, JP;
Yuko Tada, Haibara-gun, JP;
Shuhei Yamaguchi, Haibara-gun, JP;
Tomotaka Tsuchimura, Haibara-gun, JP;
Yuko Tada, Haibara-gun, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
A positive photosensitive composition includes at least one compound that when exposed to actinic rays or radiation, generates any of the sulfonic acids of general formula (I) and a resin whose solubility in an alkali developer is increased by the action of an acid, wherein each of Xand Xindependently represents a fluorine atom or a fluoroalkyl group, Rrepresents a group with a polycyclic structure, provided that the polycyclic structure may have a substituent, and Rrepresents a hydrogen atom, a chain alkyl group, a monocyclic alkyl group, a group with a polycyclic structure or a monocyclic aryl group, provided that each of the chain alkyl group, monocyclic alkyl group, polycyclic structure and monocyclic aryl group may have a substituent, and provided that Rand Rmay be bonded to each other to thereby form a polycyclic structure.