The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2012
Filed:
Oct. 18, 2010
Applicants:
Pawan Kumar Nimmakayala, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Inventors:
Pawan Kumar Nimmakayala, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Assignee:
Molecular Imprints, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck.
Quick Actions:
Nimmakayala, Pawan. (2012). Alignment system and method for a substrate in a nano-imprint process (U.S. Patent No. 8147731). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8147731
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile