The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2012
Filed:
Dec. 18, 2006
Applicants:
Kevin Chan, San Jose, CA (US);
Emmanuel Drege, Los Gatos, CA (US);
Nickhil Jakatdar, Los Altos, CA (US);
Svetlana Litvintseva, San Jose, CA (US);
Mark A. Miller, Pleasanton, CA (US);
Francis Raquel, Danville, CA (US);
Inventors:
Kevin Chan, San Jose, CA (US);
Emmanuel Drege, Los Gatos, CA (US);
Nickhil Jakatdar, Los Altos, CA (US);
Svetlana Litvintseva, San Jose, CA (US);
Mark A. Miller, Pleasanton, CA (US);
Francis Raquel, Danville, CA (US);
Assignee:
Cadence Design Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and apparatus for process optimization is provided. Process optimization improves parametric and functional yield post mask manufacturing.