The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Feb. 15, 2008
Masahiko Harumoto, Shimogyo-ku, JP;
Akira Yamaguchi, Shimogyo-ku, JP;
Akihiro Hisai, Shimogyo-ku, JP;
Masahiko Harumoto, Shimogyo-ku, JP;
Akira Yamaguchi, Shimogyo-ku, JP;
Akihiro Hisai, Shimogyo-ku, JP;
Sokudo Co., Ltd., Kyoto, JP;
Abstract
A method for developing a substrate includes a developing step for supplying a developer to the substrate, and a neutralizing and removing step for supplying a treating solution containing a neutralizing material to the substrate to neutralize the developer, and neutralizing the developer and removing the developer from the substrate. In the neutralizing and removing step, the developer is neutralized by the treating solution. This neutralization reaction forms a product (salt) which easily melts into the treating solution and does not precipitate. Thus, the product is removable from the substrate along with the treating solution. Therefore, the developer is inhibited from remaining on the substrate. As a result, it is possible to prevent post-develop defects due to 'residues of the developer' or the developer remaining on the substrate.