The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2012
Filed:
Feb. 22, 2008
Paul A. Zimmerman, Cedar Creek, TX (US);
Jeffrey Byers, Austin, TX (US);
Carita Simons, Legal Representative, Lexington, TX (US);
Paul A. Zimmerman, Cedar Creek, TX (US);
Jeffrey Byers, Austin, TX (US);
Carita Simons, legal representative, Lexington, TX (US);
Sematech, Inc., Austin, TX (US);
Intel Corporation, Austin, TX (US);
Abstract
Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or equal to about 15 nanometers. The apparatus includes the composition of matter, a light source, a platform for supporting a work piece, and a lens element. The method includes providing a light source, providing a lens element between the light source and a work piece, providing the composition of matter between the lens element and the work piece, and exposing the work piece to light provided by the light source by passing light from the light source through the lens element and the composition of matter to the work piece.