The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2012
Filed:
May. 16, 2008
Naoyuki Kobayashi, Fukaya, JP;
Akikazu Tanimoto, Yokohama, JP;
Yasushi Mizuno, Saitama, JP;
Kenichi Shiraishi, Saitama, JP;
Katsushi Nakano, Kumagaya, JP;
Soichi Owa, Kumagaya, JP;
Naoyuki Kobayashi, Fukaya, JP;
Akikazu Tanimoto, Yokohama, JP;
Yasushi Mizuno, Saitama, JP;
Kenichi Shiraishi, Saitama, JP;
Katsushi Nakano, Kumagaya, JP;
Soichi Owa, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile