The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2012
Filed:
Dec. 12, 2008
Eric B. Britcher, San Jose, CA (US);
Yevgeniy Rabinovich, Fremont, CA (US);
Svetlana Sherman, San Jose, CA (US);
Masami Ohtani, Shimogyo-ku, JP;
Eric B. Britcher, San Jose, CA (US);
Yevgeniy Rabinovich, Fremont, CA (US);
Svetlana Sherman, San Jose, CA (US);
Masami Ohtani, Shimogyo-ku, JP;
Sokudo Co., Ltd., Kyoto, JP;
Abstract
An apparatus for dispensing fluid during semiconductor substrate processing operations comprises an enclosure having a first side and a second side. The enclosure comprises a first processing station and a second processing station. The second processing station is positioned adjacent to the first processing station. In addition, the substrate processing apparatus includes a first dispense arm configured to deliver a fluid to the first processing station wherein the first dispense arm is positioned between the first side and the first processing station and a second dispense arm configured to deliver the fluid to the second processing station wherein the second dispense arm is positioned between the second side and the second processing station. The substrate processing apparatus also comprises a first rinse arm configured to deliver a rinsing fluid to the first processing station and a second rinse arm configured to deliver the rinsing fluid to the second processing station.