The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2012

Filed:

Jun. 16, 2006
Applicants:

Tadahiro Ohmi, Miyagi, JP;

Yasuyuki Shirai, Miyagi, JP;

Hitoshi Morinaga, Miyagi, JP;

Yasuhiro Kawase, Miyagi, JP;

Masafumi Kitano, Miyagi, JP;

Fumikazu Mizutani, Fukuoka, JP;

Makoto Ishikawa, Fukuoka, JP;

Yukio Kishi, Miyagi, JP;

Inventors:

Tadahiro Ohmi, Miyagi, JP;

Yasuyuki Shirai, Miyagi, JP;

Hitoshi Morinaga, Miyagi, JP;

Yasuhiro Kawase, Miyagi, JP;

Masafumi Kitano, Miyagi, JP;

Fumikazu Mizutani, Fukuoka, JP;

Makoto Ishikawa, Fukuoka, JP;

Yukio Kishi, Miyagi, JP;

Assignees:

Tohoku University, Sendai-shi, JP;

Mitsubishi Chemical Corporation, Tokyo, JP;

Nihon Ceratec Co., Ltd., Sendai-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.


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