The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Sep. 17, 2008
Lee-chung LU, Taipei, TW;
Chung-te Lin, Tainan, TW;
Yen-sen Wang, Hsin-Chu, TW;
Yao-jen Chuang, Banciao, TW;
Gwan Sin Chang, Hsin-Chu, TW;
Lee-Chung Lu, Taipei, TW;
Chung-Te Lin, Tainan, TW;
Yen-Sen Wang, Hsin-Chu, TW;
Yao-Jen Chuang, Banciao, TW;
Gwan Sin Chang, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method for forming masks for manufacturing a circuit includes providing a design of the circuit, wherein the circuit comprises a device; performing a first logic operation to determine a first region for forming a first feature of the device; and performing a second logic operation to expand the first feature to a second region greater than the first region. The pattern of the second region may be used to form the masks.