The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
May. 29, 2008
Kazuya Fukuhara, Tokyo, JP;
Tatsuhiko Higashiki, Fujisawa, JP;
Toshiya Kotani, Machida, JP;
Satoshi Tanaka, Kawasaki, JP;
Takashi Sato, Fujisawa, JP;
Akiko Mimotogi, Yokohama, JP;
Masaki Satake, Yokohama, JP;
Kazuya Fukuhara, Tokyo, JP;
Tatsuhiko Higashiki, Fujisawa, JP;
Toshiya Kotani, Machida, JP;
Satoshi Tanaka, Kawasaki, JP;
Takashi Sato, Fujisawa, JP;
Akiko Mimotogi, Yokohama, JP;
Masaki Satake, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
In a model-based OPC which makes a suitable mask correction for each mask pattern using an optical image intensity simulator, a mask pattern is divided into subregions and the model of optical image intensity simulation is changed according to the contents of the pattern in each subregion. When the minimum dimensions of the mask pattern are smaller than a specific threshold value set near the exposure wavelength, the region is calculated using a high-accuracy model and the other regions are calculated using a high-speed model.