The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Aug. 06, 2008
Eddy Cornelis Antonius Van Der Heijden, Netersel, NL;
Johannes Anna Quaedackers, Veldhoven, NL;
Dorothea Maria Christina Oorschot, Eindhoven, NL;
Hieronymus Johannus Christiaan Meessen, Eindhoven, NL;
Yin Fong Choi, Eindhoven, NL;
Eddy Cornelis Antonius Van Der Heijden, Netersel, NL;
Johannes Anna Quaedackers, Veldhoven, NL;
Dorothea Maria Christina Oorschot, Eindhoven, NL;
Hieronymus Johannus Christiaan Meessen, Eindhoven, NL;
Yin Fong Choi, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for providing a pattern on a substrate is disclosed. The method includes providing a first pattern in a first layer of photoresist and a first layer of bottom anti-reflective coating material on the substrate, etching the first pattern into the substrate, providing a second layer of photoresist and a second layer of bottom anti-reflective coating material on the substrate, providing a second pattern in the second layers of photoresist and bottom anti-reflective coating material, and etching the second pattern into the substrate, the first and second patterns on the substrate together defining the pattern.