The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2012

Filed:

Dec. 24, 2003
Applicants:

Shinichi Kai, Tokyo, JP;

Katsuhisa Aratani, Chiba, JP;

Akira Kouchiyama, Kanagawa, JP;

Kenzo Nakagawa, Kanagawa, JP;

Yoshihiro Takemoto, Tokyo, JP;

Inventors:

Shinichi Kai, Tokyo, JP;

Katsuhisa Aratani, Chiba, JP;

Akira Kouchiyama, Kanagawa, JP;

Kenzo Nakagawa, Kanagawa, JP;

Yoshihiro Takemoto, Tokyo, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); B29D 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The method of the present invention includes: an exposing process in which an inorganic resist layerformed on a substrateis irradiated with recording laser light modulated by an information signal corresponding to an information signal of an information concave and convex pattern formed on an optical disc to form an exposed pattern corresponding to the information concave and convex pattern on the optical disc, and after the above process a development process in which development processing is performed on the inorganic resist layer to form a concave and convex pattern corresponding to the information concave and convex pattern of the inorganic resist layer; in the above exposing process, after a trial exposure is performed on a non-recording area of the above resist layer, the exposed portion is irradiated with evaluation laser light and a recording signal characteristic of the above resist layer is evaluated from the reflected light to determine based on the evaluation result an optimum focus position of recording laser light which is later performed; and accordingly the recording signal characteristic (jitter value) of the optical disc is predicted and evaluated in the exposing process from the recording characteristic of the exposed portion on the resist to appropriately adjust an exposure focusing position based on the evaluation result and thus, a master having an appropriate concave and convex pattern and consequently an optical disc having an excellent characteristic can be manufactured.


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