The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Jul. 23, 2009
Kazuya Sato, Nishishirakawa, JP;
Junichi Ueno, Nishishirakawa, JP;
Syuichi Kobayashi, Nishishirakawa, JP;
Hideo Kudo, Nishishirakawa, JP;
Kazuya Sato, Nishishirakawa, JP;
Junichi Ueno, Nishishirakawa, JP;
Syuichi Kobayashi, Nishishirakawa, JP;
Hideo Kudo, Nishishirakawa, JP;
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Abstract
A carrier for a double-side polishing apparatus, including at least: a carrier base placed between upper and lower turn tables, the carrier base having a holding hole therein, the holding hole holds the wafer sandwiched between the upper and lower turn tables. A ring-shaped resin ring disposed along an inner circumference of the holding hole, the resin ring protecting a chamfered portion by making contact with the chamfered portion of the held wafer, wherein the resin ring has a concave groove on an inner circumference thereof, upper and lower tapered surfaces are formed in the concave groove. A double-side polishing apparatus using the carrier and a double-side polishing method that can reduce the generation of taper in a polished surface and improve the flatness while suppressing the generation of an outer peripheral sag of the wafer.