The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Feb. 28, 2011
Cherng-chyi Han, San Jose, CA (US);
Min LI, Dublin, CA (US);
Fenglin Liu, Milpitas, CA (US);
Jiun-ting Lee, Santa Clara, CA (US);
Cherng-Chyi Han, San Jose, CA (US);
Min Li, Dublin, CA (US);
Fenglin Liu, Milpitas, CA (US);
Jiun-Ting Lee, Santa Clara, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A perpendicular magnetic recording (PMR) head is fabricated with a self-aligned pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed from a shield layer by a RIE process characterized by a mask and gases producing a variety of etch rates. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that then separates the layer into two shields. The pole tip is then plated within the trench and an upper shield is formed above the side shields and pole.