The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8114948 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 14, 2012

Filed:

Jan. 03, 2006
Applicants:

Edmund Elce, Strongsville, OH (US);

Takashi Hirano, Tokyo, JP;

Jeffrey C. Krotine, Jr., Strongsville, OH (US);

Larry F. Rhodes, Silver Lake, OH (US);

Brian L. Goodall, Ambler, PA (US);

Saikumar Jayaraman, Chandler, AZ (US);

W. Chris Mcdougall, Midland, MI (US);

Shenliang Sun, Bethany, CT (US);

Inventors:

Edmund Elce, Strongsville, OH (US);

Takashi Hirano, Tokyo, JP;

Jeffrey C. Krotine, Jr., Strongsville, OH (US);

Larry F. Rhodes, Silver Lake, OH (US);

Brian L. Goodall, Ambler, PA (US);

SaiKumar Jayaraman, Chandler, AZ (US);

W. Chris McDougall, Midland, MI (US);

Shenliang Sun, Bethany, CT (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 10/00 (2006.01); C08F 36/00 (2006.01); C08G 59/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH—, —CH—CH— and O; m is an integer from 0 to 5; and each occurrence of R-Rare independently selected from H; Cto Clinear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; —(CH)C(O)OR; —(CH)C(O)OR; —(CH)OR; —(CH)OC(O)R; —(CH)C(O)R; —(CH)OC(O)OR; and any combination of two of R, R, R, and Rlinked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.


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Elce, Edmund. (2012). Photosensitive compositions based on polycyclic polymers (U.S. Patent No. 8114948). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8114948

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