The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
Apr. 23, 2009
Applicants:
Jae-ho Min, Gyeonggi-do, KR;
O-ik Kwon, Gyeonggi-do, KR;
Bum-soo Kim, Gyeonggi-do, KR;
Dong-chan Kim, Seoul, KR;
Myeong-cheol Kim, Gyeonggi-do, KR;
Inventors:
Jae-Ho Min, Gyeonggi-do, KR;
O-Ik Kwon, Gyeonggi-do, KR;
Bum-Soo Kim, Gyeonggi-do, KR;
Dong-chan Kim, Seoul, KR;
Myeong-cheol Kim, Gyeonggi-do, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods of forming a semiconductor device can be provided by simultaneously forming a plurality of mask patterns using self-aligned reverse patterning, including respective mask pattern elements having different widths.
Quick Actions:
Min, Jae-Ho. (2012). Methods of forming fine patterns in semiconductor devices (U.S. Patent No. 8110506). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8110506
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