The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2012

Filed:

Jan. 30, 2009
Applicant:

Mark Davidson, Palo Alto, CA (US);

Inventor:

Mark Davidson, Palo Alto, CA (US);

Assignee:

Zygo Corporation, Middlefield, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus includes an interferometer configured to generate an interference pattern by combining test light from a test object with reference light reflected from a reference object, the interferometer being further configured to direct at least a first part of a monitor test beam to the test object at a first incident angle and at least a second part of a monitor reference beam to the reference object at a second incident angle, and recombine the first part and the second part of the monitor beams after they reflect from the test and reference surfaces to interfere with one another and form a monitor pattern, where the first and second angles cause the monitor pattern to have spatial interference fringes, and wherein a change in the position of the interference fringes is indicative of a change in a relative position between the test and reference objects.


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