Exposure apparatus and method of manufacturing a device

Abstract

An exposure apparatus that exposes a shot region on a substrate to radiant energy based on an obtained position of a surface of the shot region. A projecting optical system obliquely projects detection light to a surface of a shot region on a substrate. A receiving optical system receives the detection light reflected at the shot region. A detector includes a photodetector that accumulates charges generated by the detection light incident thereon and detects a position of the detection light incident on the photodetector from the receiving optical system. A controller obtains a position of the surface based on the detection by the detector. The controller causes the projecting optical system to project the detection light, to cause the receiving optical system to cause the projected detection light to be incident on the detector, and to cause the photodetector to discharge the charges generated by light incident from the receiving optical system, during a time between an end of a detection of a first shot region by the detector and a start of a detection of a second shot region by the detector. The first shot region and the second shot region are successively measured by the detector.