The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2012

Filed:

Nov. 16, 2009
Applicants:

Stefan Schneidewind, Reichenberg, DE;

Claus Dietrich, Sacka, DE;

Jorg Kiesewetter, Dresden, DE;

Michael Teich, Friedewald, DE;

Thomas Tharigen, Dresden, DE;

Inventors:

Stefan Schneidewind, Reichenberg, DE;

Claus Dietrich, Sacka, DE;

Jorg Kiesewetter, Dresden, DE;

Michael Teich, Friedewald, DE;

Thomas Tharigen, Dresden, DE;

Assignee:

Cascade Microtech, Inc., Beaverton, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method is provided for increasing the accuracy of the positioning of a first object relative to a second object. The method overcomes the disadvantageous influence of thermal drift between a first and a second object during a positioning of a first object on a second object. The method finds applications in manufacturing, for example, in the manufacturing of semiconductor components. The method utilizes recognition of structures on the second object which have a minimum structure width. At a first instant, using one recognition procedure, the first object is positioned on the second object in a desired position. The relative displacement of the two objects is determined at the first instant and on at least one subsequent instant. A second recognition procedure may be used for this purpose. The second recognition procedure may have a resolution accuracy which is different than the resolution accuracy of the first resolution procedure. The second recognition procedure may be a pattern recognition method. The relative displacement determined at the second instant is used to correct the positioning of the first and second objects as necessary to maintain a desired position of the two objects.


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