The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Sep. 25, 2009
Akira Endo, Jena, DE;
Krzysztof Nowak, Hiratsuka, JP;
Hideo Hoshino, Hiratsuka, JP;
Tatsuya Ariga, Hiratsuka, JP;
Masato Moriya, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Akira Endo, Jena, DE;
Krzysztof Nowak, Hiratsuka, JP;
Hideo Hoshino, Hiratsuka, JP;
Tatsuya Ariga, Hiratsuka, JP;
Masato Moriya, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Gigaphoton Inc., Tokyo, JP;
Abstract
An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.