The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Oct. 21, 2008
Applicant:
Jian-bin Shiu, Hsinchu, TW;
Inventor:
Jian-Bin Shiu, Hsinchu, TW;
Assignee:
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming a phase grating is disclosed. First, a substrate is provided. Second, a first dielectric layer with a tapered recess or bulge is formed on the substrate. Later, a second dielectric layer is formed to fill the tapered recess and to cover the first dielectric layer. Afterwards, the second dielectric layer is selectively etched to form the phase grating. The phase grating includes a column and multiple rings. The column and multiple rings are concentric and the multiple rings are disposed on the tapered side so that the height of each ring is different.