The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Jul. 25, 2007
Applicant:
Masahito Hiroshima, Tokyo, JP;
Inventor:
Masahito Hiroshima, Tokyo, JP;
Assignee:
Elpida Memory, Inc., Chuo-ku, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G01N 21/00 (2006.01); H04N 9/47 (2006.01); H04N 7/18 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A reticle pattern defect correcting apparatus comprises a lithographic emulation system including an optical emulation system and a micromachining defect correcting system including a reticle defect correcting mechanism with a cantilever. Since correction of a reticle pattern defect is carried out while the transferred image is being observed in real time by the optical emulation system, it is possible to achieve an efficient reticle pattern correction while avoiding overcorrection and other problems.