The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
May. 19, 2005
Katsuhiro Yamazaki, Yokohama, JP;
Katsuhiro Yamazaki, Yokohama, JP;
Shibaura Mechatronics Corporation, Kanagawa, JP;
Abstract
The present invention prevents drop in the function of a plasma processing device caused by reduction of a plasma generating chamber by reductive plasma that is generated from the introduced process gas, and extends the life of members which are in contact with reductive plasma, especially the plasma generating chamber member. The plasma processing device of this embodiment is a device for treating the surface of a processing subject S using radicals generated by exciting a process gas, wherein a plasma generating chamber member, having a internal plasma generating chamber, is connected to a gas introduction tubeattached to the outside of the process chamber, and a gas regulatoris provided on the end of the plasma generating chamber member. The configuration is such that when the plasma generating chamber memberis reduced by the reductive plasma generated from the gas introduced from the gas regulator, a reoxidation gas will be introduced into the plasma generating chamberin place of the reductive gas from the gas regulator