The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2011
Filed:
May. 07, 2004
Johannes Adrianus Antonius Theodorus Dams, Veldhoven, NL;
Mark Kroon, Utrecht, NL;
Harm-jan Voorma, Zaltbommel, NL;
Carolus Ida Maria Antonius Spee, Helmond, NL;
Johannes Adrianus Antonius Theodorus Dams, Veldhoven, NL;
Mark Kroon, Utrecht, NL;
Harm-Jan Voorma, Zaltbommel, NL;
Carolus Ida Maria Antonius Spee, Helmond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.