The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2011

Filed:

Oct. 06, 2008
Applicants:

Chun-ming Wang, Fremont, CA (US);

Steven Maxwell, Sunnyvale, CA (US);

Paul Wai Kie Poon, Fremont, CA (US);

Yung-tin Chen, Santa Clara, CA (US);

Inventors:

Chun-Ming Wang, Fremont, CA (US);

Steven Maxwell, Sunnyvale, CA (US);

Paul Wai Kie Poon, Fremont, CA (US);

Yung-Tin Chen, Santa Clara, CA (US);

Assignee:

SanDisk 3D LLC, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making a device includes forming an underlying mask layer over an underlying layer, forming a first mask layer over the underlying mask layer, patterning the first mask layer to form first mask features, undercutting the underlying mask layer to form underlying mask features using the first mask features as a mask, removing the first mask features, and patterning the underlying layer using at least the underlying mask features as a mask.


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