The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2011
Filed:
Apr. 01, 2008
Chia-chiang Chang, Hsinchu Hsien, TW;
Chin-jyi Wu, Hsinchu Hsien, TW;
Chen-der Tsai, Hsinchu Hsien, TW;
Chun-hung Lin, Hsinchu Hsien, TW;
Chia-Chiang Chang, Hsinchu Hsien, TW;
Chin-Jyi Wu, Hsinchu Hsien, TW;
Chen-Der Tsai, Hsinchu Hsien, TW;
Chun-Hung Lin, Hsinchu Hsien, TW;
Industrial Technology Research Institute, Hsinchu Hsien, TW;
Abstract
A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile