The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2011

Filed:

Dec. 02, 2008
Applicant:

Yorio Takada, Chuo-ku, JP;

Inventor:

Yorio Takada, Chuo-ku, JP;

Assignee:

Elpida Memory, Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

An overlap amount definition section defines an amount of overlap between divided regions when a shape prediction objective region in a polished surface formed by chemical mechanical polishing is divided into a plurality of regions. A shape prediction computation processing section divides the objective region into the plurality of regions each of which includes a region corresponding to the overlap amount defined by the overlap amount definition section, and performs computation for shape prediction on each divided region by distributed processing. A merging processing section combines the results of shape prediction on the divided regions that are calculated by the shape prediction computation processing section.


Find Patent Forward Citations

Loading…