The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Jun. 07, 2007
Naoyuki Kobayashi, Fukaya, JP;
Akikazu Tanimoto, Yokohama, JP;
Yasushi Mizuno, Saitama, JP;
Kenichi Shiraishi, Saitama, JP;
Katsushi Nakano, Kumagaya, JP;
Soichi Owa, Kumagaya, JP;
Naoyuki Kobayashi, Fukaya, JP;
Akikazu Tanimoto, Yokohama, JP;
Yasushi Mizuno, Saitama, JP;
Kenichi Shiraishi, Saitama, JP;
Katsushi Nakano, Kumagaya, JP;
Soichi Owa, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanismwhich removes the liquid remaining on a partarranged in the vicinity of the image plane of the projection optical system.