The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Apr. 16, 2007
Yasuhisa Yamamoto, Yokohama, JP;
Yasuhisa Yamamoto, Yokohama, JP;
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
Double patterning using a single reticle. A blading technique may be used to allow a single reticle to be used for double patterning. The reticle is placed into a lithographic apparatus and a first portion of the pattern is exposed onto a first photoresist overlaying a target region, while blading the second portion of the pattern. Then, a second portion of the pattern is exposed onto a second photoresist, while blading the first portion. Alternatively, each portion of the pattern may be exposed to the photoresist simultaneously, but to different target regions. Then shot coordinates are adjusted and the portions are exposed to a photoresist again to allow creation of the composite pattern in at least one of the target regions. During the double patterning process, the reticle may be kept in the lithographic apparatus.