The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Dec. 03, 2008
Guenter Schwab, Neuoetting, DE;
Clemens Zapilko, Burghausen, DE;
Thomas Buschhardt, Burghausen, DE;
Diego Feijoo, Burghausen, DE;
Teruo Haibara, Hikari Yamaguchi, JP;
Yoshihiro Mori, Hikari Yamaguchi, JP;
Guenter Schwab, Neuoetting, DE;
Clemens Zapilko, Burghausen, DE;
Thomas Buschhardt, Burghausen, DE;
Diego Feijoo, Burghausen, DE;
Teruo Haibara, Hikari Yamaguchi, JP;
Yoshihiro Mori, Hikari Yamaguchi, JP;
Siltronic AG, Munich, DE;
Abstract
A method for the wet-chemical treatment of a semiconductor wafer involves: a) rotating a semiconductor wafer; b) applying a cleaning liquid comprising gas bubbles having a diameter of 100 μm or less to the rotating wafer such that a liquid film forms on the wafer; c) exposing the rotating semiconductor wafer to a gas atmosphere containing a reactive gas; and d) removing the liquid film from the wafer.