The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2011
Filed:
Sep. 28, 2010
Applicants:
Marcus Adrianus Van DE Kerkhof, GT Helmond, NL;
M'hamed Akhssay, GV Helmond, NL;
Mamoun El Ouasdad, WG Culemborg, NL;
Asis Uasghiri, LZ Rotterdam, NL;
Inventors:
Marcus Adrianus Van De Kerkhof, GT Helmond, NL;
M'Hamed Akhssay, GV Helmond, NL;
Mamoun El Ouasdad, WG Culemborg, NL;
Asis Uasghiri, LZ Rotterdam, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/74 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus configured to apply corrections to the dose, within and/or between fields, to compensate for critical dimension variations due to heating of elements of the projection system is disclosed.
Van De Kerkhof, Marcus. (2011). Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements (U.S. Patent No. 8068212). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8068212
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile