The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2011
Filed:
Oct. 09, 2008
Jozef Augustinus Maria Alberti, Nederweert, NL;
Gerardus Petrus Matthijs Van Nunen, Berghem, NL;
Frans Erik Groensmit, Helmond, NL;
Rene Theodorus Petrus Compen, Valkenswaard, NL;
Jozef Augustinus Maria Alberti, Nederweert, NL;
Gerardus Petrus Matthijs Van Nunen, Berghem, NL;
Frans Erik Groensmit, Helmond, NL;
Rene Theodorus Petrus Compen, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention relates to a method of transferring a substrate from a first substrate holder to a second substrate holder in a lithographic projection apparatus by using a transfer unit on the basis of transfer data available thereto. The second substrate holder has a surface provided with a first plurality of burls. In the method, a memory encoded with burl position data and substrate position data is provided. Subsequently, a substrate is provided on the first substrate holder. The position error and orientation of the substrate is then measured. On the basis of the burl position data, substrate position data and orientation as measured orientation adjustment data are calculated. The orientation of the substrate is subsequently adjusted in accordance with the orientation adjustment data. The substrate is then transferred from the first substrate holder to the second substrate holder by the transfer unit and placed on the second substrate holder.