The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Jan. 17, 2008
Jaione Tirapu-azpiroz, Poughkeepsie, NY (US);
Kafai Lai, Poughkeepsie, NY (US);
David O. S. Melville, New York, NY (US);
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Kehan Tian, Poughkeepsie, NY (US);
Jaione Tirapu-Azpiroz, Poughkeepsie, NY (US);
Kafai Lai, Poughkeepsie, NY (US);
David O. S. Melville, New York, NY (US);
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Kehan Tian, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method, system, computer program product and table lookup system for calculating image intensity for a mask used in integrated circuit processing are disclosed. A method may comprise: decomposing a Manhattan polygon of the mask into decomposed areas based on parallel edges of the Manhattan polygon along only one dimension; determining a convolution of each decomposed area based on a table lookup; determining a sum of coherent systems contribution of the Manhattan polygon based on the convolutions of the decomposed areas; and outputting the determined sum of coherent system contribution for analyzing the mask.