The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
May. 28, 2004
Antoine Hendrik Verweij, Dussen, NL;
Jacobus Frederik Molenaar, Utrecht, NL;
Gerbrand Petrus Johannes Van Den Hoven, Gernert, NL;
Michael Johannes Vervoordeldonk, Rosmalen, NL;
Michel Gerardus Pardoel, Mierlo, NL;
Gerardus Johannes Verdoes, Eindhoven, NL;
Jan Van Eijk, Eindhoven, NL;
Antoine Hendrik Verweij, Dussen, NL;
Jacobus Frederik Molenaar, Utrecht, NL;
Gerbrand Petrus Johannes Van Den Hoven, Gernert, NL;
Michael Johannes Vervoordeldonk, Rosmalen, NL;
Michel Gerardus Pardoel, Mierlo, NL;
Gerardus Johannes Verdoes, Eindhoven, NL;
Jan Van Eijk, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.