The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Sep. 29, 2006
Gabriel George Barna, Richardson, TX (US);
Andrew Marshall, Dallas, TX (US);
Brian K. Kirkpatrick, Allen, TX (US);
Gabriel George Barna, Richardson, TX (US);
Andrew Marshall, Dallas, TX (US);
Brian K. Kirkpatrick, Allen, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method of manufacturing a semiconductor device having shallow trench isolation includes steps of forming a hard mask layer on the substrate surface, etching a trench through the hard mask, filling the trench with an isolation material, forming a recessed trench, and forming a serpentine gate structure to connect electronic sources and drains.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile