The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Jan. 21, 2008
Blake Koelmel, Palo Alto, CA (US);
Alexander N. Lerner, San Jose, CA (US);
Joseph M. Ranish, San Jose, CA (US);
Kedarnath Sangam, Sunnyvale, CA (US);
Khurshed Sorabji, San Jose, CA (US);
Blake Koelmel, Palo Alto, CA (US);
Alexander N. Lerner, San Jose, CA (US);
Joseph M. Ranish, San Jose, CA (US);
Kedarnath Sangam, Sunnyvale, CA (US);
Khurshed Sorabji, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the invention contemplate a method, apparatus and system that are used to support, position, and rotate a substrate during processing. Embodiments of the invention may also include a method of controlling the transfer of heat between a substrate and substrate support positioned in a processing chamber. The apparatus and methods described herein remove the need for complex, costly and often unreliable components that would be required to accurately position and rotate a substrate during one or more processing steps, such as an rapid thermal processing (RTP) process, a chemical vapor deposition (CVD) process, a physical vapor deposition (PVD) process, atomic layer deposition (ALD) process, dry etching process, wet clean, and/or laser annealing process.