The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2011

Filed:

Sep. 11, 2006
Applicants:

Daniela White, Oswego, IL (US);

John Parker, Naperville, IL (US);

Inventors:

Daniela White, Oswego, IL (US);

John Parker, Naperville, IL (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); B24D 3/02 (2006.01); C09C 1/68 (2006.01); B32B 5/16 (2006.01); B32B 9/00 (2006.01); B32B 15/02 (2006.01); B32B 17/02 (2006.01); B32B 21/02 (2006.01); B32B 23/02 (2006.01); B32B 27/02 (2006.01); B32B 27/38 (2006.01); C08K 3/10 (2006.01); C08K 3/22 (2006.01); C09D 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides an isolated, particulate polyoxometalate complex comprising a water-soluble cationic polymer and a polyoxometalate compound ionically bound to the cationic polymer. The polyoxometalate compound can be an isopolyoxometalate compound, such as an isopolytungstate, or a heteropolyoxometalate compound. The invention further provides a chemical-mechanical polishing composition comprising a preformed polyoxometalate abrasive, as well as a method of chemically-mechanically polishing a substrate therewith.


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