The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Nov. 05, 2007
Jong-an Kim, Seoul, KR;
Yu-sin Yang, Seoul, KR;
Chung-sam Jun, Suwon-si, KR;
Moon-shik Kang, Yongin-si, KR;
Ji-hye Kim, Anyang-si, KR;
Jong-An Kim, Seoul, KR;
Yu-Sin Yang, Seoul, KR;
Chung-Sam Jun, Suwon-si, KR;
Moon-Shik Kang, Yongin-si, KR;
Ji-Hye Kim, Anyang-si, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
In a method of detecting defects of patterns on a semiconductor substrate and an apparatus for performing the method information on positions of reference defects influencing an operation of a circuit including the patterns when the patterns are formed on the semiconductor substrate is acquired in advance. Preliminary defects of the patterns formed on the semiconductor substrate are detected. Positions of the preliminary defects of the patterns are compared with positions of the reference defects. The preliminary defects having the positions substantially the same as the positions of the reference defects are set to be defects of the patterns so that the actual defects are detected.