The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Oct. 12, 2006
Edward Crandal Cooney, Iii, Jericho, VT (US);
William Joseph Murphy, North Ferrisburgh, VT (US);
Anthony Kendall Stamper, Williston, VT (US);
David Craig Strippe, Westford, VT (US);
Edward Crandal Cooney, III, Jericho, VT (US);
William Joseph Murphy, North Ferrisburgh, VT (US);
Anthony Kendall Stamper, Williston, VT (US);
David Craig Strippe, Westford, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An apparatus and a method for operating the same. The method includes providing an apparatus which includes a chamber, wherein the chamber includes first and second inlets, an anode and a cathode structures in the chamber, and a wafer on the cathode structure. A cleaning gas is injected into the chamber via the first inlet. A collecting gas is injected into the chamber via the second inlet. The cleaning gas when ionized has a property of etching a top surface of the wafer resulting in a by-product mixture in the chamber. The collecting gas has a property of preventing the by-product mixture from depositing back to the surface of the wafer.