The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8048611 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 01, 2011

Filed:

Apr. 24, 2009
Applicants:

Hideto Kato, Annaka, JP;

Tomoyoshi Furihata, Annaka, JP;

Masahiro Furuya, Annaka, JP;

Yoshinori Hirano, Annaka, JP;

Inventors:

Hideto Kato, Annaka, JP;

Tomoyoshi Furihata, Annaka, JP;

Masahiro Furuya, Annaka, JP;

Yoshinori Hirano, Annaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C—O—C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.


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Kato, Hideto. (2011). Polyorganosiloxane, resin composition, and patterning process (U.S. Patent No. 8048611). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8048611

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