The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Apr. 13, 2011
Katsumi Shibayama, Hamamatsu, JP;
Takafumi Yokino, Hamamatsu, JP;
Tomofumi Suzuki, Hamamatsu, JP;
Helmut Teichmann, Zurich, CH;
Dietmar Hiller, Zurich, CH;
Ulrich Starker, Zurich, CH;
Katsumi Shibayama, Hamamatsu, JP;
Takafumi Yokino, Hamamatsu, JP;
Tomofumi Suzuki, Hamamatsu, JP;
Helmut Teichmann, Zurich, CH;
Dietmar Hiller, Zurich, CH;
Ulrich Starker, Zurich, CH;
Hamamatsu Photonics K.K., Hamamatsu-shi, Shizuoka, JP;
Abstract
Alignment marks, andare formed on the flat planeof the peripheral edge portionformed integrally with the diffracting layer, and when the lens portionis mounted onto the substrate, these alignment marksandare positioned to the substrate, thereby making exact alignment of the diffracting layerwith respect to the light detecting portionof the light detecting element, for example, not by depending on a difference in curvature radius of the lens portion. In particular, the alignment marksandare formed on the flat plane, thereby image recognition is given to exactly detect positions of the alignment marksand, thus making it possible to make exact alignment.