The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Oct. 22, 2008
Applicants:
Ephrem G. Gebreselasie, Shelburne, VT (US);
William T. Motsiff, Essex Junction, VT (US);
Wolfgang Sauter, Richmond, VT (US);
Steven H. Voldman, South Burlington, VT (US);
Inventors:
Ephrem G. Gebreselasie, Shelburne, VT (US);
William T. Motsiff, Essex Junction, VT (US);
Wolfgang Sauter, Richmond, VT (US);
Steven H. Voldman, South Burlington, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
Abstract
A structure includes a substrate. A trench structure is arranged within the substrate. A film is placed under an interlevel dielectric pad and between portions of the trench structure.