The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2011

Filed:

Jun. 19, 2006
Applicants:

Shinichi Maeda, Funabashi, JP;

Go Ono, Funabashi, JP;

Inventors:

Shinichi Maeda, Funabashi, JP;

Go Ono, Funabashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/335 (2006.01); H01L 29/43 (2006.01); H01L 21/44 (2006.01); G03F 7/004 (2006.01); G03F 6/038 (2006.01); G03C 1/73 (2006.01); B05D 5/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is an electrode patterning layer used for forming an electrode pattern of any optional shape depending on the difference in wettability with an electrode-forming solution, the electrode patterning layer employing a polyimide type resin which is highly reliable as an electronic material. The electrode patterning layer is prepared by irradiating a layer comprising a polyamic acid having repeating units at the formula (1) or a polyimide obtainable by cyclodehydration of such a polyamic acid, with ultraviolet ray in a pattern shape: wherein A is a tetravalent organic group, B is a bivalent organic group, each of A and B may be of a single type or plural types, and n is a positive integer, provided that at least one type of A is a tetravalent organic group having an alicyclic structure.


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