The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Feb. 01, 2008
Applicants:
Christoph Noelscher, Nuremberg, DE;
Yi-ming Chiu, Dresden, DE;
Yuan-hsun Wu, Dresden, DE;
Inventors:
Assignee:
Qimonda AG, München, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of double patterning is disclosed. The method includes forming a first photosensitive layer; exposing the first photosensitive layer using a first reticle; developing the first photosensitive layer thereby forming a first image pattern including first elements; forming a second photosensitive layer; exposing the second photosensitive layer using the first reticle; and developing the second photosensitive layer thereby forming a second image pattern.
Quick Actions:
Noelscher, Christoph. (2011). Method of double patterning, method of processing a plurality of semiconductor wafers and semiconductor device (U.S. Patent No. 8043794). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8043794
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile