The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Mar. 14, 2008
Gerhard Hauck, Badenhausen, DE;
Celin Savariar-hauck, Badenhausen, DE;
Udo Dwars, Herzberg/Harz, DE;
Harald Baumann, Osterode/Harz, DE;
Bernd Strehmel, Berlin, DE;
Christopher D. Simpson, Osterode, DE;
Gerhard Hauck, Badenhausen, DE;
Celin Savariar-Hauck, Badenhausen, DE;
Udo Dwars, Herzberg/Harz, DE;
Harald Baumann, Osterode/Harz, DE;
Bernd Strehmel, Berlin, DE;
Christopher D. Simpson, Osterode, DE;
Eastman Kodak Company, Rochester, NY (US);
Abstract
Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.