The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
May. 19, 2009
Yvonne Wendela Kruijt-stegeman, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Sander Frederik Wuister, Eindhoven, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Catharinus DE Schiffart, Nijmegen, NL;
Norbert Erwin Therenzo Jansen, Eindhoven, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Sander Frederik Wuister, Eindhoven, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Catharinus De Schiffart, Nijmegen, NL;
Norbert Erwin Therenzo Jansen, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.