The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2011

Filed:

Sep. 06, 2005
Applicants:

Hisashi Kato, Odawara, JP;

Shinichi Suzuki, Kawasaki, JP;

Inventors:

Hisashi Kato, Odawara, JP;

Shinichi Suzuki, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for inspecting defects and attachment position of an attached OVD without any influence of a change in the pattern of the OVD due to fluttering or undulation during conveyance of the printed product. Image input means and illumination means are arranged at positions where mirror reflected light and diffracted light from the OVD have values equal to or less than a threshold value upon a binarization process by image processing means. The image processing means executes the binarization process, compares the image data with the reference image data or the image data with the reference image data and the data indicating the reference position, and determines the acceptability of at least one of the form, area, and position of the OVD attached to the base material on the basis of a comparison result.


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